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process of RF power. The change of the etch rate and the LLS peak intensity according to the change of the duty ratio shows that the optimal process condition which satisfies the high selectivity, the high etch rate and the low particulate growth level can be obtained with the RF modulation method.
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process. Soft baking process is done on heat plate at 120℃, 90sec. In third step, you do photo process. Photo process is putting the mask(printing your name on transparent paper like OHP film to make mask) on the glass and exposure UV in vacuum condition for 300sec. After Photo process, you put the
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