[실험레포트] 미세유체칩(Micro-Fluid Chips) 실험보고서

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[실험레포트] 미세유체칩(Micro-Fluid Chips) 실험보고서에 대한 보고서 자료입니다.

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An experimental study on the process of fine research micro-fluid chips using photoresist(PR)

Hong gil dong, Mechanical Engineering, Seoul University

Abstract Prior to the beginning of the experiment, to ensure smooth progress, the experimenter should refrain from wearing clothes that could be dusty until the development process, and the laboratory should be equipped with the ability to remove dust continuously. And use a blocking lamp to prevent Photoresist (PR) from becoming stiff in response to Ultraviolet rays (UV).
Experiments go through 10 processes from creating channels in Wafer to producing them with PDMS casting. First of all, it goes through 7 processes to create channels in the wager. Spin coating (two different rotations) the wafer with the Su-8 photoresist. The process of soft baking is performed according to the thickness of the coating. It is carried out in accordance with Table 1.(Heat each at 65° 95). When the process is finished, the wafer is cooled off from the outside. After adhering the MASK and the Wafer prepared for putting the channel into the Wafer, refer to Table 2. and apply the Exposure Energy considering the thickness and time. After exposure, perform photo exposure bake as shown in Table 3. Remove the passive PR except the negative PR parts exposed to UV on the SU-8 resist components coated in the Wafer. Once the development process has been completed, the positive PR is removed and the desired 'T' shaped channel can be seen visually.

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