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Of many horror movies, the English director James Whale’s three films, Frankenstein(1930), Bride of Frankenstein(1935), and The Invisible Man(1933), produced by Universal Studio are the most important works representing horror films of 1930s. Especially, Bride of Frankenstein, which is Whale’s last
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in Asia, noting what he considered to be grassroots aspects of both Chinese and Vietnamese communism, such as in his 1968 essay, \"Objectivity and Liberal Scholarship\", where he claimed there were \"certain similar features\" with the Spanish anarchist movement of the 1930s (which he greatly admire
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in intuitive realization than logical and used it well. I think that\'s why he was nominated for the Academy Award for Best Screenplay.
3. References
※ Channel Yes <What do Hollywood\'s successful original films have in common?> 1. (Required Question) Pick one aspect of film form (cinemat
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Films, to be published in J. Korean Phys. Soc.
[18] Kenneth T. Leong, James C. Booth, and Sang Young Lee, Influence of Impedance Mismatch Effects on Measurements of Unloaded Q Factors of Transmission Mode Dielectric Resonators, IEEE Trans. on Applied Superconductivity , vol. 13, No.2 (2003).
[19] J.
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films deposited by pulsed laser deposition - J. Appl. Phys. 85, 7884 (1999); doi:10.1063/1.370601
Heterostructures of ZnOZn coaxial nanocables and ZnO nanotubes - Appl. Phys. Lett. 81, 1312 (2002); doi:10.1063/1.1499512
Initial preferred growth in zinc oxide thin films on Si and amorphous substr
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in Research 1 and Research 2, it has a negative effect on perceived ease of use in Research 2. As computer anxiety referring to “a level of anxiety or horror that an individual feels in a situation where s/he should use a computer” becomes higher, the usefulness of the DAS service can be more recogn
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In this paper, the inspection of surface properties under n-octadecyltrichlorosilane treated SiO2 film was carried out by current-voltage characteristic and the scanning electron microscope. The voltage at zero current in low electric field is the lowest at 0.3 % OTS treated SiO2 film with hybrid ty
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